Author

I.-C. Chen

Institution: Applied Materials (United States)

Observed institution: Applied Materials (United States)

OpenAlex ID: A5041802205

Highly-selective superconformai CVD Ti silicide process enabling area-enhanced contacts for next-generation CMOS architectures

2017 · N. Breil, A. Carr, et al. · Symposium on VLSI Technology · 29

Works count: 1

Citation count: 29

H-index: 1

I10-index: 1