Product
Help
Pricing
About
Jobs
Log in
Get started
Author
Add to collection
Akinori Ohkubo
Observed name:
Akinori OHKUBO
Institution:
Samsung Electronics (South Korea)
Observed institutions:
Canon (Japan),
Pioneer (United States),
Samsung (South Korea),
Pioneer (Japan),
Samsung Electronics (South Korea)
OpenAlex ID:
A5042301565
Recent progress of EUV wavefront metrology in EUVA
2004
·
Masanobu Hasegawa
, Chidane Ouchi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
19
Super-contrast-enhanced darkfield imaging of nano objects through null ellipsometry
2018
·
Seongkeun Cho
, Janghwi Lee
, et al.
·
Optics Letters
·
13
ArF immersion lithography: critical optical issues
2004
·
Tokuyuki Honda
, Yasuhiro Kishikawa
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
12
Thermally Induced Effects of Stimulated Brillouin Scattering via Phase-Conjugation Mirror for Repetitive Laser Pulse.
2001
·
Hidetsugu YOSHIDA
, Akinori OHKUBO
, et al.
·
The Review of Laser Engineering
·
10
PDF
Signal-to-noise ratio evaluation for the nanometer-scale patterned defect inspection using dark-field microscopy with tailored polarization illumination
2020
·
Akinori Ohkubo
, Janghwi Lee
, et al.
·
8
What determines the ultimate resolution? The critical relationship between exposure tools and photoresists
2006
·
Tokuyuki Honda
, Yasuhiro Kishikawa
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
EUVA’s challenges toward 0.1nm accuracy in EUV at-wavelength interferometry
2006
·
Katsumi Sugisaki
, Masanobu Hasegawa
, et al.
·
Springer eBooks
·
6
Jitter Analysis for Land/Groove Phase Change Disk
2001
·
Akinori Ohkubo
, Takuma Yanagisawa
, et al.
·
Japanese Journal of Applied Physics
·
4
PDF
Assessment of trade-off between resist resolution and sensitivity for optimization of hyper-NA immersion lithography
2007
·
Yasuhiro Kishikawa
, Miyoko Kawashima
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Complete Isolation of the Back Reflection By Stimulated Brillouin Scattering Phase Conjugation
1998
·
Hong Jin Kong
, Yeona Kang
, et al.
·
The Review of Laser Engineering
·
3
On-machine laser spot diagnostics by scanning linear image sensor for maskless lithography system
2022
·
Akinori Ohkubo
, Jiyoung Chu
, et al.
·
Optical Manufacturing and Testing
·
1
Through-focus spot shaping with asymmetric pupil optimization for laser stealth dicing
2021
·
Akinori Ohkubo
, Sungho Jang
, et al.
·
Laser Beam Shaping
·
1
Analysis of imaging properties for hyper-NA ArF immersion lithography
2005
·
Yoshiyuki Sekine
, Miyoko Kawashima
, et al.
·
Optical Microlithography XVIII
·
1
Inverse optical design using quasi-two-dimensional partially coherent imaging for photolithography overlay metrology
2023
·
Akinori Ohkubo
, Sungho Jang
, et al.
·
Optical Modeling and Performance Predictions
Visible upconversion photoluminescence of bulk silicon and mesoscale silicon nanoparticles
2020
·
Boris I. Afinogenov
, Anton S. Medvedev
, et al.
·
Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices
Single nanoparticle detection in the far field by nonlinear optical method
2020
·
EunHee Jeang
, Boris I. Afinogenov
, et al.
·
SPIE Conference on Nonlinear Optics and its Applications
Influence of resist blur on resolution of hyper-NA immersion lithography beyond 45-nm half-pitch
2009
·
Minoru Yoshii
, Yasuhiro Kishikawa
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
Generation of frequency-modulated light using cross phase modulation in an optical fiber
1996
·
Satoshi Matsuoka
, N. Miyanaga
, et al.
·
レーザー学会学術講演会年次大会講演予稿集 = Annual meeting, of the Laser Society of Japan digest of technical papers
Show more works
View as search
Works count:
18
Citation count:
88
H-index:
6
I10-index:
4
Year
Topic
Type
