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William J. Dauksher

Observed names: W Dauksher, W J Dauksher, W. Dauksher, W. J. Dauksher, W.J. Dauksher, William Dauksher, William J Dauksher
OpenAlex ID: A5044551981
Imprint lithography for integrated circuit fabrication
2003 · D. J. Resnick, W. J. Dauksher, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 122
Template fabrication schemes for step and flash imprint lithography
2002 · T.C. Bailey, D.J. Resnick, et al. · Microelectronic Engineering · 110
>750 mV open circuit voltage measured on 50 μm thick silicon heterojunction solar cell
2013 · Stanislau Y. Herasimenka, William J. Dauksher, et al. · Applied Physics Letters · 105
ITO/SiOx:H stacks for silicon heterojunction solar cells
2016 · Stanislau Y Herasimenka, William J Dauksher, et al. · Solar Energy Materials and Solar Cells · 73
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Model for a multiple-step deep Si etch process
2002 · Shahid Rauf, William J. Dauksher, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 51
High-resolution templates for step and flash imprint lithography
2002 · Douglas J. Resnick, William J. Dauksher, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 45
Characterization of and imprint results using indium tin oxide-based step and flash imprint lithography templates
2002 · W. J. Dauksher, K. J. Nordquist, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 44
Method for fabricating a low stress x-ray mask using annealable amorphous refractory compounds
1995 · W. J. Dauksher, D. J. Resnick, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 39
Distortion and overlay performance of UV step and repeat imprint lithography
2005 · Jin Choi, Kevin Nordquist, et al. · Microelectronic Engineering · 38
Effects of etch barrier densification on step and flash imprint lithography
2005 · S. Johnson, R. Burns, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 35
Manipulation of K center charge states in silicon nitride films to achieve excellent surface passivation for silicon solar cells
2014 · Vivek Sharma, Clarence Tracy, et al. · Applied Physics Letters · 34
Improving surface passivation on very thin substrates for high efficiency silicon heterojunction solar cells
2020 · Pradeep Balaji, William J. Dauksher, et al. · Solar Energy Materials and Solar Cells · 32
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Mesoscale modeling for SFIL simulating polymerization kinetics and densification
2004 · Ryan L. Burns, Stephen C. Johnson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 31
Improved step and flash imprint lithography templates for nanofabrication
2003 · D.J. Resnick, D. Mancini, et al. · Microelectronic Engineering · 31
High resolution templates for step and flash imprint lithography
2002 · Douglas J. Resnick, William J. Dauksher, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 31
A new operating regime for electroplating the gold absorber on x-ray masks
1994 · W.J. Dauksher, D.J. Resnick, et al. · Microelectronic Engineering · 29
Nano-imprint lithography: Templates, imprinting and wafer pattern transfer
2006 · W.J. Dauksher, N.V. Le, et al. · Microelectronic Engineering · 28
Advances in Step and Flash imprint lithography
2003 · Stephen C. Johnson, Todd C. Bailey, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 28
Development of Cu plating for silicon heterojunction solar cells
2016 · Antony Aguilar, Stanislau Y Herasimenka, et al. · Conference record of the IEEE Photovoltaic Specialists Conference · 26
Surface passivation of n-type c-Si wafers by a-Si/SiO2/SiNx stack with <1 cm/s effective surface recombination velocity
2013 · Stanislau Y. Herasimenka, Clarence J. Tracy, et al. · Applied Physics Letters · 26
Fabrication of a surface acoustic wave-based correlator using step-and-flash imprint lithography
2004 · G. F. Cardinale, J. L. Skinner, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 24
Imprint lithography: lab curiosity or the real NGL
2003 · Douglas J. Resnick, William J. Dauksher, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 24
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Cr absorber etch process for extreme ultraviolet lithography mask fabrication
2001 · K. H. Smith, J. R. Wasson, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 24
Fabrication of multi-tiered structures on step and flash imprint lithography templates
2003 · S. Johnson, D.J. Resnick, et al. · Microelectronic Engineering · 23
RF MEMS resonator for CMOS back-end-of-line integration
2005 · S. Pacheco, P. Zurcher, et al. · IEEE Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems (SiRF) · 22
Works count: 111
Citation count: 1,497
H-index: 23
I10-index: 38
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