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Pavel Mareš

Observed names: Mareš, Pavel, P. Mares, P. Mareš
ORCID: 0000-0003-3643-4743
Observed ORCID: 0000-0003-3643-4743
OpenAlex ID: A5045979796
Ion energy distributions at substrate in bipolar HiPIMS: effect of positive pulse delay, length and amplitude
2020 · Tomáš Kozák, Andrea Dagmar Pajdarová, et al. · Plasma Sources Science and Technology · 38
Plasma parameters in positive voltage pulses of bipolar HiPIMS discharge determined by Langmuir probe with a sub-microsecond time resolution
2020 · Andrea Dagmar Pajdarová, Tomáš Kozák, et al. · Plasma Sources Science and Technology · 32
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Superior high-temperature oxidation resistance of magnetron sputtered Hf–B–Si–C–N film
2015 · P. Zeman, Š. Zuzjaková, et al. · Ceramics International · 28
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Hard multifunctional Hf–B–Si–C films prepared by pulsed magnetron sputtering
2013 · Jiří Kohout, Jaroslav Vlček, et al. · Surface and Coatings Technology · 24
High deposition rate films prepared by reactive HiPIMS
2021 · P. Mareš, M. Dubau, et al. · Vacuum · 23
Effect of the Si content on the microstructure of hard, multifunctional Hf–B–Si–C films prepared by pulsed magnetron sputtering
2015 · Minghui Zhang, Jiechao Jiang, et al. · Applied Surface Science · 20
Dependence of characteristics of MSiBCN (M = Ti, Zr, Hf) on the choice of metal element: Experimental and ab-initio study
2016 · J. Houska, P. Mares, et al. · Thin Solid Films · 18
Multilayer thin films of aluminum oxide and tantalum oxide deposited by pulsed direct current magnetron sputtering for dielectric applications
2023 · Richard Drevet, Pavel Souček, et al. · Vacuum · 17
Effect of exit-orifice diameter on Cu nanoparticles produced by gas-aggregation source
2021 · Š. Batková, T. Kozák, et al. · Surface and Coatings Technology · 17
Long-term stability and disappearing anode effects during reactive DC and pulsed bipolar magnetron sputtering of Al2O3
2019 · Pavel Mareš, Stanislav Kadlec, et al. · Vacuum · 15
Dependence of structure and properties of hard nanocrystalline conductive films MBCN (M = Ti, Zr, Hf) on the choice of metal element
2015 · J. Houska, J. Kohout, et al. · Thin Solid Films · 14
Aluminum tantalum oxide thin films deposited at low temperature by pulsed direct current reactive magnetron sputtering for dielectric applications
2023 · Richard Drevet, Pavel Souček, et al. · Vacuum · 12
Hybrid HiPIMS + controlled pulsed arc for deposition of hard coatings
2022 · Jiří Vyskočil, Pavel Mareš, et al. · Surface and Coatings Technology · 9
Effect of energetic particles on pulsed magnetron sputtering of hard nanocrystalline MBCN (M = Ti, Zr, Hf) films with high electrical conductivity
2019 · Pavel Mareš, Jaroslav Vlček, et al. · Thin Solid Films · 9
Influence of oxygen flow on the structure, chemical composition, and dielectric strength of AlxTayOz thin films deposited by pulsed-DC reactive magnetron sputtering
2025 · Richard Drevet, Pavel Souček, et al. · Surface and Coatings Technology · 6
Growth defects in WC:H layers for tribological applications
2020 · Tomáš Mates, Jan Polášek, et al. · Vacuum
マグネトロンスパッタリングHf‐B‐Si‐C‐N膜の超高温耐酸化性
2016 · P. Zeman, Š. Zuzjaková, et al. · Ceramics International
Works count: 19
Citation count: 283
H-index: 12
I10-index: 12
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