Work

Multilayer thin films of aluminum oxide and tantalum oxide deposited by pulsed direct current magnetron sputtering for dielectric applications

Year: 2023

Type: article

Source: Vacuum

DOI: 10.1016/j.vacuum.2023.111870

Authors: Richard Drevet, Pavel Souček, Pavel Mareš, Martin Dubau, Zsolt Czigány, Katalin Balázsi, Petr Vašina

Institutions: Masaryk University, HVM Plasma (Czechia), Institute for Technical Physics and Materials Science, HUN-REN Centre for Energy Research

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4318052104

FWCI: 1.212

Cites: 56

Cited by: 17

Related to: 10