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Yohan Choi

A Survey of Datasets, Preprocessing, Modeling Mechanisms, and Simulation Tools Based on AI for Material Analysis and Discovery
2022 · Imran, Faiza Qayyum, et al. · Materials · 59
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A Dual-Mode Continuously Scalable-Conversion-Ratio SC Energy Harvesting Interface With SC-Based PFM MPPT and Flying Capacitor Sharing Scheme
2021 · Hyunjin Kim, Junyoung Maeng, et al. · IEEE Journal of Solid-State Circuits · 39
An 11-b 100-MS/s Fully Dynamic Pipelined ADC Using a High-Linearity Dynamic Amplifier
2020 · Yunsoo Park, Jaegeun Song, et al. · IEEE Journal of Solid-State Circuits · 28
Curvilinear masks: an overview
2021 · Yohan Choi, Aki Fujimura, et al. · SPIE Photomask Technology Conference · 26
An 88.9-dB SNR Fully-Dynamic Noise-Shaping SAR Capacitance-to-Digital Converter
2022 · Chaegang Lim, Yohan Choi, et al. · IEEE Journal of Solid-State Circuits · 21
A 9-bit 500-MS/s 2-bit/cycle SAR ADC With Error-Tolerant Interpolation Technique
2021 · Jaegeun Song, Yunsoo Park, et al. · IEEE Journal of Solid-State Circuits · 20
A 101.6-dB-SNDR Fully Dynamic Zoom ADC Using Miller-Compensated Floating Inverter Amplifiers
2024 · Yohan Choi, Woojin Lee, et al. · IEEE Transactions on Circuits & Systems II Express Briefs · 15
A Capacitively Coupled CT Δ ΣM With Chopping Artifacts Rejection for Sensor Readout ICs
2021 · Chaegang Lim, Yohan Choi, et al. · IEEE Transactions on Circuits and Systems I Regular Papers · 9
Curvilinear masks overview: manufacturable mask shapes are more reliably manufacturable
2024 · Aki Fujimura, Yohan Choi, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 8
Wafer hot spot identification through advanced photomask characterization techniques
2016 · Yohan Choi, Michael Green, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
A 7-bit 1.15-GS/s 2.6-bit/Cycle Asynchronous SAR ADC Using Comparator Decision Skip Technique With Background Offset Calibration
2025 · Sooho Park, Changjoo Kim, et al. · IEEE Journal of Solid-State Circuits · 4
EUV mask challenges and requirements for ultimate single exposure interconnects
2019 · Chris Progler, Michael Green, et al. · Extreme Ultraviolet (EUV) Lithography · 3
Fogging Effect Consideration in Mask Process at 50 KeV E-Beam Systems
2002 · Seung-Hune Yang, Yo-Han Choi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
EUV mask manufacturing readiness in the merchant mask industry
2017 · Michael Green, Yohan Choi, et al. · International Conference on Extreme Ultraviolet Lithography · 2
Mask manufacturing of advanced technology designs using multi-beam lithography (Part 1)
2016 · Michael Green, Young Ham, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Trends in mask data preparation
2014 · Aki Fujimura, Liyong Pang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Proximity effect correction optimization considering fogging and loading effects compensation
2002 · Seung-Hune Yang, Yo-Han Choi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
A 6-bit 3.6-GS/s 4-Channel Time-Interleaved ADC With Front-Rank MSB Decision and 2-Then-1.5-bit/Cycle Architecture
2026 · Changjoo Kim, Sooho Park, et al. · IEEE Transactions on Circuits and Systems I Regular Papers · 1
A 1 MS/s 9.15 ENOB Low-Power SAR ADC with Triple-Charge-Sharing Technique
2020 · Soonsung Ahn, Jaegeun Song, et al. · International SoC Design Conference · 1
Wafer hot spot identification through advanced photomask characterization techniques: part 2
2017 · Yohan Choi, Michael Green, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Development of Operation and Control Technology of Energy Storage System for Frequency Regulation and Operation by Grid Connected Automatic Control
2016 · Geon-Pyo Lim, Yo-Han Choi, et al. · 전기학회논문지 P · 1
Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes
2002 · Yo-Han Choi, Jong-Rak Park, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Analytical Approach to X-Phenomenon in Alternating Phase-Shifting Masks
2002 · Jong Rak Park, Soon Ho Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Erratum to “A 7-bit 1.15-GS/s 2.6-bit/Cycle Asynchronous SAR ADC Using Comparator Decision Skip Technique With Background Offset Calibration”
2025 · Sooho Park, Changjoo Kim, et al. · IEEE Journal of Solid-State Circuits
Deep Reinforcement Learning-Based Tax and Economic Agents Policy Optimization Simulation Environment Analysis and Experiment
2023 · Joo-Seong Heo, Yo-Han Choi, et al. · 한국통신학회논문지
Works count: 36
Citation count: 255
H-index: 8
I10-index: 7
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