Work

Proximity effect correction optimization considering fogging and loading effects compensation

Year: 2002

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.473426

Authors: Seung-Hune Yang, Yo-Han Choi, Jong R. Park, Yong-Hoon Kim, Seong-Woon Choi, Jung-Min Sohn

Institution: Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1978309987

FWCI:

Cites:

Cited by: 2

Related to: 10