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Seong-Woon Choi
Observed names:
Seong-woon Choi,
SeongWoon Choi,
Seongwoon Choi
Institution:
Samsung Electronics (South Korea)
Observed institutions:
Samsung (South Korea),
Samsung Electronics (South Korea)
OpenAlex ID:
A5111527003
Block copolymer multiple patterning integrated with conventional ArFlithography
2009
·
Seung Hak Park
, Dong Ok Shin
, et al.
·
Soft Matter
·
69
The new test pattern selection method for OPC model calibration, based on the process of clustering in a hybrid space
2012
·
Dmitry Vengertsev
, Kihyun Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
22
Hotspot fixing using ILT
2011
·
Woojoo Sim
, Sunggon Jung
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
17
The analysis of EUV mask defects using a wafer defect inspection system
2010
·
Kyoung-Yong Cho
, Joo-On Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
16
Physical simulation for verification and OPC on full chip level
2011
·
Seongbo Shim
, Seongho Moon
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Manufacturability evaluation of model-based OPC masks
2002
·
Sung-Hoon Jang
, Sonny Y. Zinn
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
The application of EUV lithography for 40nm node DRAM device and beyond
2009
·
Joo-on Park
, Chawon Koh
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
The study on causes and control methods of haze contamination
2005
·
Sung-Jae Han
, Bo-Hye Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
Evaluation of the attenuated PSM performance as the shifter transmittance and illumination systems
1999
·
Yong-Hoon Kim
, JoHyun Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
Analysis of dry etch loading effect in mask fabrication
2002
·
Jeong-Yun Lee
, Sung-Yong Cho
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Methodology of flare modeling and compensation in EUVL
2008
·
Insung Kim
, Hoyoung Kang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Detailed analysis of capability and limitations of CD scatterometry measurements for 65- and 45-nm nodes
2007
·
Irina Pundaleva
, Roman Chalykh
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Optical performance comparison between negative tone development and positive tone development
2012
·
Seung-Hune Yang
, Eun Sung Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Quantitative analysis of develop loading effect and its application
2004
·
Hak-Seung Han
, Se-Gun Moon
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Impact of mask CD error on wafer CD error at low-k 1 photolithography
1999
·
Byung G. Kim
, Seong-Woon Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Real-time monitoring based on comprehensive analysis of the haze environment under the pellicle film
2006
·
Jaehyuck Choi
, Seungyeon Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
A study of Cr to Mosi in-situ dry etching process to reduce plasma induced defect
2005
·
Il-Yong Jang
, Young-Ju Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Measurement of the flare and in-field linewidth variation due to the flare
2002
·
Tae Moon Jeong
, Seong-Woon Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Fine calibration of physical resist models: the importance of Jones pupil, laser bandwidth, mask error and CD metrology for accurate modeling at advanced lithographic nodes
2011
·
Seongho Moon
, Seunghune Yang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Assessment of full-chip level EUV optical correction for sub-40nm memory device
2009
·
Jeonghoon Lee
, Insung Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Optimization of mask manufacturing rule check constraint for model based assist feature generation
2008
·
Seongbo Shim
, Young-chang Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Optical proximity correction for elongated contact-hole printing
2008
·
Young-Chang Kim
, Sangwook Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Dose-modulation-induced mask CD error on simultaneous correction of fogging and loading effect
2003
·
Hojune Lee
, Seung-Hune Yang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Application of Cr-less mask technology for sub-100nm gate with single exposure
2002
·
Sung-Hyuck Kim
, Dong-Hoon Chung
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
A new correction method for dry etch loading effect in photomask fabrication
2002
·
Won-Tai Ki
, Seung-Hune Yang
, et al.
·
International Microprocesses and Nanotechnology Conference (MNC)
·
2
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Works count:
94
Citation count:
241
H-index:
7
I10-index:
6
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