Work

Block copolymer multiple patterning integrated with conventional ArFlithography

Year: 2009

Type: article

Source: Soft Matter

DOI: 10.1039/b913853f

Authors: Seung Hak Park, Dong Ok Shin, Bong Hoon Kim, Dong Ki Yoon, Kyoungseon Kim, Si Yong Lee, Seok-Hwan Oh, Seong-Woon Choi, Sang Chul Jeon, Sang Ouk Kim

Institutions: Korea Advanced Institute of Science and Technology, Samsung (South Korea), Samsung Electronics (South Korea), National NanoFab Center

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2059613757

FWCI: 4.104

Cites: 33

Cited by: 69

Related to: 10