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Jung-Min Sohn

OpenAlex ID: A5110047673
Study of characteristics and control of haze contamination induced by photochemical reaction
2003 · Sung-Jae Han, Sang-Yong Yu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Manufacturability evaluation of model-based OPC masks
2002 · Sung-Hoon Jang, Sonny Y. Zinn, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Simulation of critical dimension error using Monte Carlo method and its experimental verification
2002 · Sonny Y. Zinn, Sung-Woo Lee, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 10
Evaluation of the attenuated PSM performance as the shifter transmittance and illumination systems
1999 · Yong-Hoon Kim, JoHyun Park, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Process Technology for Next Generation Photomask
1998 · Jung-Min Sohn, Byung-Gook Kim, et al. · Japanese Journal of Applied Physics · 7
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Flare in Microlithographic Exposure Tools
2002 · Tae Moon Jeong, Sung-Woon Choi, et al. · Japanese Journal of Applied Physics · 6
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Analysis of dry etch loading effect in mask fabrication
2002 · Jeong-Yun Lee, Sung-Yong Cho, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Improvement of column spacer uniformity in a TFT LCD panel
2006 · Jung-Hyuk Cho, Jung-Min Sohn, et al. · Journal of the Korean Physical Society · 5
Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask
2003 · Jong Rak Park, Soon Ho Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Impact of mask CD error on wafer CD error at low-k 1 photolithography
1999 · Byung G. Kim, Seong-Woon Choi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Mask process proximity correction for next-generation mask fabrication
2003 · Soon Ho Kim, Sung-Woon Choi, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 3
Optical properties of a-Si films for 157-nm lithography
2003 · SungKwan Kim, YangSoo Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Fogging Effect Consideration in Mask Process at 50 KeV E-Beam Systems
2002 · Seung-Hune Yang, Yo-Han Choi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Measurement of the flare and in-field linewidth variation due to the flare
2002 · Tae Moon Jeong, Seong-Woon Choi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Dose-modulation-induced mask CD error on simultaneous correction of fogging and loading effect
2003 · Hojune Lee, Seung-Hune Yang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Develpment of etch rate uniformity adjustment technology for photomask quartz etch in manufacturing the 100% attenuated PSM
2003 · Il-Yong Jang, Jeong-Yoon Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Application of Cr-less mask technology for sub-100nm gate with single exposure
2002 · Sung-Hyuck Kim, Dong-Hoon Chung, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
A new correction method for dry etch loading effect in photomask fabrication
2002 · Won-Tai Ki, Seung-Hune Yang, et al. · International Microprocesses and Nanotechnology Conference (MNC) · 2
Proximity effect correction optimization considering fogging and loading effects compensation
2002 · Seung-Hune Yang, Yo-Han Choi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Comparative study on MEEF and dose latitude between attenuated PSM and Cr binary masks
2000 · Hyun J. Cho, Yong-Hoon Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Evaluation of the practical use of GHOST technique for various e-beam resists
1998 · Byung-Cheol Cha, Jin-Min Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Monte Carlo Simulation Study of Local Critical Dimension Error on Mask and Wafer
2004 · Byoung-sup Ahn, Joon-Soo Park, et al. · Japanese Journal of Applied Physics · 1
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New method for approaching the loading-free process for photomask Cr etching
2003 · Il-Yong Jang, Jeong-Yun Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process
2003 · Sung-Yong Cho, Won-Suk Ahn, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Fast topography simulation using differential method
2003 · Sonny Y. Zinn, Sung-Hyuck Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Works count: 71
Citation count: 112
H-index: 6
I10-index: 3
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