Work

Simulation of critical dimension error using Monte Carlo method and its experimental verification

Year: 2002

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.1524978

Authors: Sonny Y. Zinn, Sung-Woo Lee, Sung-Woon Choi, Jung-Min Sohn

Institutions: Samsung (South Korea), Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Johns Hopkins University

OpenAlex ID: W1995313115

FWCI: 2.751

Cites: 8

Cited by: 10

Related to: 10