Work

Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Year: 2003

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.504055

Authors: Sung-Yong Cho, Won-Suk Ahn, Won-Il Cho, Moon-Gyu Sung, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Institution: Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2093660196

FWCI: 0.45

Cites: 3

Cited by: 1

Related to: 10