Work

New method for approaching the loading-free process for photomask Cr etching

Year: 2003

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.517842

Authors: Il-Yong Jang, Jeong-Yun Lee, Sung-Yong Moon, Seong-Woon Choi, Jung-Min Sohn

Institution: Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1992102154

FWCI: 0.45

Cites:

Cited by: 1

Related to: 10