Author

Hardik Jain

Observed name: Jain, Hardik Shantilal

Institutions: Holst Centre (Netherlands), Eindhoven University of Technology

Observed institutions: Holst Centre (Netherlands), Eindhoven University of Technology

ORCID: 0000-0002-3042-4854

Observed ORCID: 0000-0002-3042-4854

OpenAlex ID: A5049622945

About the importance of purge time in molecular layer deposition of alucone films

2021 · Hardik Jain, Paul Poodt · Dalton Transactions · 34

Excellent conformality of atmospheric-pressure plasma-enhanced spatial atomic layer deposition with subsecond plasma exposure times

2023 · Mike L. van de Poll, Hardik Jain, et al. · Applied Physics Letters · 12

Spatial atmospheric pressure molecular layer deposition of alucone films using dimethylaluminum isopropoxide as the precursor

2022 · Hardik Jain, Mariadriana Creatore, et al. · Dalton Transactions · 7

Molecular layer deposition of alucone in high aspect ratio trenches: The effect of TMA outgassing on step-coverage

2022 · Hardik Jain, Mariadriana Creatore, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 6

Spatial Atomic Layer Deposition of Iridium Oxide Electrocatalyst Layers for PEM Electrolysis

2023 · Corné Frijters, Hardik Jain, et al. · ECS Meeting Abstracts · 1

Erratum: “Excellent conformality of atmospheric-pressure plasma-enhanced spatial atomic layer deposition with subsecond plasma exposure times” [Appl. Phys. Lett. 123 , 182902 (2023)]

2023 · Mike L. van de Poll, Hardik Jain, et al. · Applied Physics Letters

Works count: 7

Citation count: 60

H-index: 4

I10-index: 2