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Erratum: “Excellent conformality of atmospheric-pressure plasma-enhanced spatial atomic layer deposition with subsecond plasma exposure times” [Appl. Phys. Lett. 123 , 182902 (2023)]

Year: 2023

Type: erratum

Abstract: This is a correction to: Excellent conformality of atmospheric-pressure plasma-enhanced spatial atomic layer deposition with subsecond plasma exposure times Articles You May Be Interested InExcellent conformality of atmospheric-pressure plasma-enhanced spatial atomic layer deposition with subsecond plasma exposure times Appl.Phys.Lett.(October 2023) Subsecond relaxation of internal field after polarization reversal in congruent LiNbO 3 and LiTaO 3 crystals Appl.Phys.Lett.(October 2000) Atomic layer deposition of zinc oxide films on lateral high-aspect-ratio test structures using diethylzinc and water as precursors

Source: Applied Physics Letters

DOI: 10.1063/5.0188189

Authors: Mike L. van de Poll, Hardik Jain, James N. Hilfiker, Mikko Utriainen, Paul Poodt, Wilhelmus M. M. Kessels, Bart Macco

Institutions: Eindhoven University of Technology, Holst Centre (Netherlands), J.A. Woollam Company (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W4389599996

Cites: 1

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