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David Cruau
Observed name:
D. Cruau
Institutions:
Commissariat à l'Énergie Atomique et aux Énergies Alternatives,
CEA Grenoble,
Laboratoire d'Électronique des Technologies de l'Information
Observed institutions:
Commissariat à l'Énergie Atomique et aux Énergies Alternatives,
CEA Grenoble,
Laboratoire d'Électronique des Technologies de l'Information,
American Society for Indexing
OpenAlex ID:
A5052069839
Leaching mechanisms in immersion lithography with or without top coat
2007
·
S. Gaugiran
, R. Feilleux
, et al.
·
Microelectronic Engineering
·
14
Ultra Thin Chips Stacking on Tsv Silicon Interposer Using Back-to-face Technology
2012
·
G. Parès
, F. Schnegg
, et al.
·
IMAPSource Proceedings
·
5
Engineering nano interfacial layers for low contact resistance in chip to package interconnects
2009
·
Jianwen Steven Xu
, Lakshmi Ramanathan
, et al.
·
IEEE Electronic Components and Technology Conference (ECTC)
·
3
Investigation on immersion defectivity root cause
2007
·
V. Farys
, S. Gaugiran
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Integrating immersion lithography in 45-nm logic manufacturing
2007
·
Michael Benndorf
, Scott Warrick
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Immersion lithography robustness for the C065 node
2006
·
Scott Warrick
, Rob Morton
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
6
Citation count:
23
H-index:
3
I10-index:
1
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