Work

Immersion lithography robustness for the C065 node

Year: 2006

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.657158

Authors: Scott Warrick, Rob Morton, Andrea Mauri, Jean-Damien Chapon, Jerome Belledent, Will Conley, Alex Barr, Kevin Lucas, Cedric Monget, Valerie Plantier, David Cruau, Juan-Manuel Gomez, Emmanuel Sicurani, Jan-Willem Gemmink

Institutions: Philips (France), STMicroelectronics (France), Commissariat à l'Énergie Atomique et aux Énergies Alternatives

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1985779859

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