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Andre Leschok

OpenAlex ID: A5056215313
Source mask optimization methodology (SMO) and application to real full chip optical proximity correction
2012 · DongQing Zhang, GekSoon Chua, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 20
3D resist profile full chip verification and hot spot disposition
2013 · Qing Yang, ShyueFong Quek, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Reticle and wafer CD variation for different dummy pattern
2012 · GuoXiang Ning, Christian Buergel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Effects of focus difference of nested and isolated features for scanner proximity matching
2013 · GuoXiang Ning, Paul Ackmann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Correlation between reticle- and wafer-CD difference of multiple 28nm reticle-sites
2012 · Guoxiang Ning, Frank Richter, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 5
Citation count: 33
H-index: 3
I10-index: 1
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