Work

Source mask optimization methodology (SMO) and application to real full chip optical proximity correction

Year: 2012

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.916614

Authors: DongQing Zhang, GekSoon Chua, YeeMei Foong, Yi Zou, Stephen Hsu, Stanislas Baron, Mu Feng, Hua-Yu Liu, Zhipan Li, Jessy Schramm, T. Yun, Carl Babcock, Byoung IL Choi, Stefan Roling, Alessandra Navarra, Tanja Fischer, Andre Leschok, Xiaofeng Liu, Weijie Shi, Jianhong Qiu, Russell Dover

Institution: GlobalFoundries (Singapore)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2119829122

FWCI: 2.438

Cites: 8

Cited by: 20

Related to: 10