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Julio Morris

OpenAlex ID: A5061980559
High-Performance HfO 2 /Al 2 O 3 Superlattice MIM Capacitor in a 200 mm High-Volume Batch-ALD Platform
2024 · Partha Mukhopadhyay, Ivan Fletcher, et al. · IEEE Transactions on Electron Devices · 8
A novel approach to mitigate stress induced defects at metal-dielectric interface in Redistribution layers for 3D IC stacking
2020 · Amit Kumar, Jose Chacon, et al. · IMAPSource Proceedings · 1
Impact of plasma conditioning-state evolution on Cl2/Ar plasma-assisted Si atomic layer etching
2026 · Hwan Oh, Julio Morris, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Impact of Plasma Conditioning-State Evolution on Cl2/Ar Plasma-Assisted Si Atomic Layer Etching
2026 · Chang-Yong Nam, Ming Lu, et al. · AIP Publishing
Supplemental Material
2026 · AIP Admin, Hwan Oh, et al. · AIP Publishing
Works count: 5
Citation count: 9
H-index: 1
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