Author

Wallace P. Printz

Observed name: Wallace Printz

Observed institution: Tokyo Electron (Japan)

OpenAlex ID: A5064580929

Etching of Silicon Nitride in 3D NAND Structures

2015 · Derek Bassett, Wallace Printz, et al. · ECS Transactions · 28

Advances and challenges in dual-tone development process optimization

2009 · Carlos Fonseca, Mark Somervell, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22

Line-pattern collapse mitigation status for EUV at 32nm HP and below

2012 · Michael Carcasi, Derek Bassett, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Etching of Silicon Nitride in 3D NAND Structures

2015 · Derek Bassett, Wallace Printz, et al. · ECS Meeting Abstracts · 3

Advanced Cryogenic Aerosol Cleaning: Small Particle Removal and Damage-Free Performance

2016 · Chimaobi Mbanaso, Jeffery W. Butterbaugh, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 2

Procédé Et Appareil De Contrôle Dynamique De La Température D'un Procédé De Gravure Humide

2017 · Antonio Rotondaro, Wallace Printz

Process latitude simulation of positive-tone litho-litho-etch double patterning

2009 · Wallace P. Printz, Steven A. Scheer · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 7

Citation count: 59

H-index: 3

I10-index: 2