Work

Advances and challenges in dual-tone development process optimization

Year: 2009

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.814289

Authors: Carlos Fonseca, Mark Somervell, Steven Scheer, Wallace Printz, Kathleen Nafus, Shinichi Hatakeyama, Yuhei Kuwahara, Takafumi Niwa, Sophie Bernard, Roel Gronheid

Institutions: Tokyo Electron (Japan), Tokyo Electron Kyushu Ltd (Japan), IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2104017208

FWCI: 3.748

Cites: 2

Cited by: 22

Related to: 10