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Author

Shinichi Hatakeyama

Observed name: S. Hatakeyama
OpenAlex ID: A5082298487
Advances and challenges in dual-tone development process optimization
2009 · Carlos Fonseca, Mark Somervell, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22
Resist fundamentals for resolution, LER, and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects
2009 · Benjamin Rathsack, Kathleen Nafus, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17
Effect of PAG Distribution on ArF and EUV Resist Performance
2009 · Roel Gronheid, Benjamin Rathsack, et al. · Journal of Photopolymer Science and Technology · 9
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LWR reduction by novel lithographic and etch techniques
2010 · Shinji Kobayashi, Satoru Shimura, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
193nm immersion process defect generation and reduction mechanism investigation using analytical methods
2006 · Masashi Enomoto, Shinichi Hatakeyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Defectivity reduction by optimization of 193-nm immersion lithography using an interfaced exposure-track system
2006 · Michael Carcasi, Shinichi Hatakeyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Investigation of EUV-process sensitivities for wafer-track processing
2009 · Neil Bradon, Heiko Weichert, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Image contrast contributions to immersion lithography defect formation and process yield
2008 · Ben Rathsack, Josh Hooge, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
A CDU comparison of double patterning process options using Monte Carlo simulation
2009 · Josh Hooge, Shinichi Hatakeyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Process manufacturability evaluation for next generation immersion technology node
2008 · M. Enomoto, T. Shimoaoki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Tunnel‐oxide breakdown characteristics of floating‐gate‐type EEPROM
1989 · Kazuo Sato, Yoshiki Fukuzaki, et al. · Electronics and Communications in Japan (Part II Electronics) · 1
Initial process evaluation for next generation immersion technology node
2007 · Tadatoshi Tomita, Kathleen Nafus, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 12
Citation count: 70
H-index: 5
I10-index: 2
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