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É. Fogarassy

A thermal description of the melting of c- and a-silicon under pulsed excimer lasers
1989 · S. de Unamuno, E. Fogarassy · Applied Surface Science · 204
XPS study of pulsed laser deposited CNx films
2001 · F. Le Normand, J. Hommet, et al. · Physical review. B, Condensed matter · 172
Recent advances in laser processing of materials
2006 · Perriere, Jacques, Millon, Eric, et al. · HAL · 165
Laser Ablation of Electronic Materials: Basic Mechanisms and Applications
1992 · É. Fogarassy, Sylvain Lazare · 144
Modification of SiO through room-temperature plasma treatments, rapid thermal annealings, and laser irradiation in a nonoxidizing atmosphere
1988 · F. Rochet, G. Dufour, et al. · Physical review. B, Condensed matter · 124
Laser-induced forward transfer of high-T c YBaCuO and BiSrCaCuO superconducting thin films
1989 · E. Fogarassy, C. Fuchs, et al. · Journal of Applied Physics · 86
Silicon solar cells realized by laser induced diffusion of vacuum-deposited dopants
1981 · E. Fogarassy, R. Stuck, et al. · Journal of Applied Physics · 80
Chemical analysis of pulsed laser deposited a-CN films by comparative infrared and X-ray photoelectron spectroscopies
2000 · T. Szörényi, C. Fuchs, et al. · Surface and Coatings Technology · 62
Laser-induced forward transfer: A new approach for the deposition of high Tc superconducting thin films
1989 · E. Fogarassy, C. Fuchs, et al. · Journal of materials research/Pratt's guide to venture capital sources · 62
Numerical and experimental analysis of pulsed excimer laser processing of silicon carbide
2001 · C Dutto, E Fogarassy, et al. · Applied Surface Science · 53
Low-temperature synthesis of silicon oxide, oxynitride, and nitride films by pulsed excimer laser ablation
1994 · E. Fogarassy, C. Fuchs, et al. · Journal of Applied Physics · 51
SiO2 thin-film deposition by excimer laser ablation from SiO target in oxygen atmosphere
1990 · E. Fogarassy, C. Fuchs, et al. · Applied Physics Letters · 50
Pulsed laser crystallization and doping for the fabrication of high-quality poly-Si TFTs
1993 · E. Fogarassy, H. Pattyn, et al. · Applied Surface Science · 42
Ablation dynamics of silicon based targets in oxygen and nitrogen atmospheres
1994 · W. Marine, V. Tokarev, et al. · Thin Solid Films · 39
Advances in laser ablation of materials
1998 · Rajiv K. Singh, D. H. Lowndes, et al. · OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information) · 37
Melting threshold of crystalline and amorphized Si irradiated with a pulsed ArF (193 nm) excimer laser
1988 · F. Foulon, E. Fogarassy, et al. · Applied Physics A · 36
Low temperature polysilicon TFTs: a comparison of solid phase and laser crystallization
1995 · F. Plais, P. Legagneux, et al. · Microelectronic Engineering · 35
Modeling of CW laser diode irradiation of amorphous silicon films
2010 · Z. Said-Bacar, Y. Leroy, et al. · Applied Surface Science · 34
Laser-induced diffusion by irradiation of silicon dipped into an organic solution of the dopant
1981 · R. Stuck, E. Fogarassy, et al. · Applied Physics Letters · 33
Properties of silicon dioxide films prepared by pulsed-laser ablation
1992 · A. Slaoui, E. Fogarassy, et al. · Journal of Applied Physics · 31
Micro structuring of LiNbO3 by using nanosecond pulsed laser ablation
2007 · F. Meriche, E. Neiss-Clauss, et al. · Applied Surface Science · 30
Large area, high resolution analysis of surface roughness of semiconductors using interference microscopy
2002 · P.C. Montgomery, A. Benatmane, et al. · Materials Science and Engineering B · 30
Thermal stability of amorphous carbon films deposited by pulsed laser ablation
2000 · S. Rey, F. Antoni, et al. · Applied Physics A · 30
Solubility limit of impurities in silicon after laser induced melting
1980 · R. Stuck, E. Fogarassy, et al. · Applied Physics A · 29
Deposition of SiO2 by reactive excimer laser ablation from a SiO target
1990 · E. Fogarassy, A. Slaoui, et al. · Applied Surface Science · 28
Works count: 219
Citation count: 2,801
H-index: 27
I10-index: 73
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