SiO2 thin-film deposition by excimer laser ablation from SiO target in oxygen atmosphere
Year: 1990
Type: article
Source: Applied Physics Letters
DOI: 10.1063/1.104253
Authors: E. Fogarassy, C. Fuchs, A. Slaoui, J. P. Stoquert
Language: English
Subfield: Industrial and Manufacturing Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1978187756