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Wytze Keuning

Observed names: Keuning, W, Keuning, W Wytze, Keuning, W., W Keuning, W. Keuning
OpenAlex ID: A5065752180
In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition
2009 · E Langereis, S B S Heil, et al. · Journal of Physics D Applied Physics · 313
Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
2010 · S. E. Potts, W. Keuning, et al. · Journal of The Electrochemical Society · 188
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Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
2012 · G. Dingemans, C. A. A. van Helvoirt, et al. · Journal of The Electrochemical Society · 152
Identifying parasitic current pathways in CIGS solar cells by modelling dark J–V response
2015 · Benjamin L. Williams, Sjoerd Smit, et al. · Progress in Photovoltaics Research and Applications · 126
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Fully Plastic Dye Solar Cell Devices by Low‐Temperature UV‐Irradiation of both the Mesoporous TiO2 Photo‐ and Platinized Counter‐Electrodes
2013 · Valerio Zardetto, Francesco Di Giacomo, et al. · Advanced Energy Materials · 70
Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
2011 · W. Keuning, P. van de Weijer, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 51
A Comparative Study of the Effects of Nontoxic Chloride Treatments on CdTe Solar Cell Microstructure and Stoichiometry
2015 · Benjamin L. Williams, Jonathan D. Major, et al. · Advanced Energy Materials · 40
On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
2014 · Alberto Perrotta, Erik R.J. van Beekum, et al. · Microporous and Mesoporous Materials · 37
Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
2016 · I. J. M. Erkens, M. A. Verheijen, et al. · The Journal of Chemical Physics · 25
Opportunities for Plasma-Assisted Atomic Layer Deposition
2007 · Erwin Kessels, Stephan Heil, et al. · ECS Transactions · 24
PTFE treatment by remote atmospheric Ar/O2plasmas: a simple reaction scheme model proposal
2016 · E A D Carbone, M W G M Verhoeven, et al. · Journal of Physics Conference Series · 23
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Controlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition (vol 112, 043708, 2012)
2012 · M. V. Ponomarev, Marcel A. Verheijen, et al. · DIFFER: Publications · 21
Synergy Between Plasma‐Assisted ALD and Roll‐to‐Roll Atmospheric Pressure PE‐CVD Processing of Moisture Barrier Films on Polymers
2015 · Sergey A. Starostin, Wytze Keuning, et al. · Plasma Processes and Polymers · 20
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Thermal and Plasma Enhanced Atomic Layer Deposition of Al[sub 2]O[sub 3] on GaAs Substrates
2009 · Sonja Sioncke, Annelies Delabie, et al. · Journal of The Electrochemical Society · 18
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Influence of stoichiometry on the performance of MIM capacitors from plasma‐assisted ALD SrxTiyOz films
2013 · N. Aslam, V. Longo, et al. · physica status solidi (a) · 12
Controlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition
2012 · M. V. Ponomarev, M. A. Verheijen, et al. · Journal of Applied Physics · 10
A new concept for spatially divided Deep Reactive Ion Etching with ALD-based passivation
2012 · F Roozeboom, B Kniknie, et al. · IOP Conference Series Materials Science and Engineering · 9
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Atomic Layer Deposition of High-k Dielectric Layers on Ge and III-V MOS Channels
2008 · Annelies Delabie, A. Alian, et al. · ECS Transactions · 9
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Multi-channel Andreev reflection in Co–W nanocontacts fabricated using focused electron/ion beam induced deposition
2014 · N Sharma, P Vugts, et al. · Nanotechnology · 7
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PTFE treatment by remote atmospheric Ar/O2 plasmas: a simple reaction scheme model proposal
2013 · Carbone, E. A. D., Verhoeven, M. W. G. M., et al. · arXiv (Cornell University) · 5
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Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
2009 · Stephen E. Potts, Luc R. Van den Elzen, et al. · ECS Transactions · 4
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A New Concept for Spatially-Divided Reactive Ion Etching with ALD-Based Passivation
2013 · F. Roozeboom, Bas Kniknie, et al. · ECS Transactions · 3
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Alternative technology concepts for low-cost and high-speed 2D and 3D interconnect manufacturing
2013 · F. Roozeboom, M. Smets, et al. · IMAPSource Proceedings · 2
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Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
2009 · Stephen E. Potts, Luc R. Van den Elzen, et al. · ECS Meeting Abstracts · 1
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In situ spectroscopic ellipsometry for atomic layer deposition
2009 · E. Langereis, Sbs Stephan Heil, et al. · TU/e Research Portal · 1
Works count: 48
Citation count: 1,172
H-index: 14
I10-index: 16
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