Work

Influence of stoichiometry on the performance of MIM capacitors from plasma‐assisted ALD SrxTiyOz films

Year: 2013

Type: article

Source: physica status solidi (a)

DOI: 10.1002/pssa.201330101

Authors: N. Aslam, V. Longo, W. Keuning, F. Roozeboom, W. M. M. Kessels, R. Waser, S. Hoffmann‐Eifert

Institutions: Forschungszentrum Jülich, Jülich Aachen Research Alliance, Eindhoven University of Technology

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2108198545

FWCI: 0.558

Cites: 24

Cited by: 12

Related to: 10