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J. Li
Institution:
IBM (United States)
Observed institutions:
IBM (United States),
IBM Research - Albany
OpenAlex ID:
A5067424490
Air spacer for 10nm FinFET CMOS and beyond
2016
·
K. Cheng
, C. Surisetty
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
29
A novel ALD SiBCN low-k spacer for parasitic capacitance reduction in FinFETs
2015
·
T. Yamashita
, S. Mehta
, et al.
·
Symposium on VLSI Technology
·
23
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Works count:
2
Citation count:
52
H-index:
2
I10-index:
2
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