Author

Alexander Pravdivtsev

Observed names: A. Pravdivtsev, A. V. Pravdivtsev

OpenAlex ID: A5074195331

Low-coherence interferometric absolute distance gauge for study of MEMS structures

2005 · Wojciech J. Walecki, Kevin Lai, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15

High-speed high-accuracy fiber optic low-coherence interferometry for in situ grinding and etching process monitoring

2006 · Wojciech J. Walecki, Alexander Pravdivtsev, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Non-contact fast wafer metrology for ultra-thin patterned wafers mounted on grinding and dicing tapes

2004 · W. Walecki, V. Suchkov, et al. · IEEE/CPMT International Electronics Manufacturing Technology Symposium · 8

Novel Noncontact Thickness Metrology for Partially Transparent and Nontransparent Wafers for Backend Semiconductor Manufacturing

2004 · Wojciech J. Walecki, Vitali Souchkov, et al. · MRS Proceedings · 5

Metrology of semiconductor structures using novel Fabry Perot fringe stretching system

2017 · Wojtek J. Walecki, Alexander Pravdivtsev · SPIE Applied Optical Metrology · 3

Use of optical metrology for wafer level packaging of CMOS image sensor

2010 · D. Le Cunff, A. Pravdivtsev, et al. · IEEE International D Systems Integration Conference · 3

Synchronized low coherence interferometry for in-situ and ex-situ metrology for semiconductor manufacturing

2005 · Wojciech J. Walecki, Alexander Pravdivtsev, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Fiber-optics Low-coherence Integrated Metrology for In-Situ Non-contact Characterization of Wafer Curvature for Wafers Having Non-uniform Substrate and Thin Film Thickness

2005 · Wojciech J. Walecki, Alexander Pravdivtsev, et al. · MRS Proceedings · 3

Metrologic platform with a modulation interference microscope

2012 · A. V. Loparev, E. V. Romash, et al. · Journal of Optical Technology · 2

Combined effect of an IR optical system’s design and process parameters on the background irradiation on the detector

2019 · A. V. Pravdivtsev · Journal of Optical Technology

Measurement of ultra low film stress, local stress distribution and flatness by imaging nanotopography based on low coherence phase shifting interferometry in conjunction with wafer and film thickness metrology

2007 · Alexander Pravdivtsev, Manuel Santos II, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Low Coherence Metrology for Wafer Level Packaging

2005 · Wojtek J. Walecki, Talal Azfar, et al. · Wafer-Level Packaging Symposium

Measurement of the Diffusion Length in Silicon Wafers with Improved Spatial Resolution

1994 · Vladimir Faifer, V. G. Dyukov, et al. · European Solid-State Device Research Conference

Works count: 13

Citation count: 52

H-index: 4

I10-index: 2