Work

Fiber-optics Low-coherence Integrated Metrology for In-Situ Non-contact Characterization of Wafer Curvature for Wafers Having Non-uniform Substrate and Thin Film Thickness

Year: 2005
Type: article
Language: English
Open Access status: closed
OpenAlex ID: W2948337642
FWCI: 0.713
Cites: 10
Cited by: 3
Related to: 10