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Yasunori Oka
Observed name:
Y. Oka
Observed institution:
Nagoya University
OpenAlex ID:
A5075359296
A Method of Quantitative Contamination with Metallic Impurities of the Surface of a Silicon Wafer
1988
·
Masataka Hourai
, Toshio Naridomi
, et al.
·
Japanese Journal of Applied Physics
·
114
PDF
A Method of Quantitative Contamination with Metallic Impurities of the Surface of a Silicon Wafer : Semiconductors and Semiconductor Devices
1988
·
Masataka Hourai
, Toshio Naridomi
, et al.
·
Japanese Journal of Applied Physics
Ion implantation with controlled nonuniformity
1980
·
Y. Oka
·
Journal of Vacuum Science and Technology
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Works count:
3
Citation count:
114
H-index:
1
I10-index:
1
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