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A Method of Quantitative Contamination with Metallic Impurities of the Surface of a Silicon Wafer : Semiconductors and Semiconductor Devices

Year: 1988

Type: article

Source: Japanese Journal of Applied Physics

Authors: Masataka Hourai, Toshio Naridomi, Yasunori Oka, Katsumi Murakami, Shigeo Sumita, Nobukatsu Fujino, Toshio Shiraiwa

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W627256552

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