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Sarohan Park
Observed institutions:
Yonsei University,
IMEC,
SK Hynix (South Korea)
OpenAlex ID:
A5077633848
Catalytic Combustion of Methane over Rare Earth Stannate Pyrochlore
2003
·
Sarohan Park
, Hae Jin Hwang
, et al.
·
Catalysis Letters
·
71
Comparative study of DRAM cell patterning between ArF immersion and EUV lithography
2009
·
Tae-Seung Eom
, Sarohan Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
9
Comparative study of binary intensity mask and attenuated phase shift mask using hyper-NA immersion lithography for sub-45nm era
2008
·
Tae-Seung Eom
, Jun-Taek Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
9
EUV contact holes and pillars patterning
2015
·
Sarohan Park
, Danilo De Simone
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Study on restricting factors of practical k1 limit in 0.33NA EUV lithography
2017
·
Sunyoung Koo
, Mijung Lim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Study on the reduction of defects in immersion lithography
2007
·
Keundo Ban
, Sarohan Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
EUV-patterning characterization using a 3D mask simulation and field EUV scanner
2009
·
Jun-Taek Park
, Yoon-Suk Hyun
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Hyper NA polarized imaging of 45nm DRAM
2007
·
Chang-Moon Lim
, Sarohan Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Staggered pillar patterning using 0.33NA EUV lithography
2019
·
Danilo De Simone
, Romuald Blanc
, et al.
·
Extreme Ultraviolet (EUV) Lithography
·
2
Extension of practical k1 limit in EUV lithography
2016
·
Sarohan Park
, Inwhan Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Diffraction-based overlay for spacer patterning and double patterning technology
2011
·
Byoung Hoon Lee
, JeongSu Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Alternative technology for double patterning process simplification
2008
·
Hee-Youl Lim
, Kyo-Young Jang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Hardware, materials, and parameters optimization for improvement of immersion overlay
2007
·
Won-Kwang Ma
, Young-sun Hwang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
NZO improvement on DRAM by novel recipe optimization algorithm
2026
·
Hyunsok Kim
, Sunghwan Seo
, et al.
·
Metrology, Inspection, and Process Control XXXVI
Improvement of EUV mix-match overlay for production implementation
2016
·
Sarohan Park
, ByoungHoon Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Improvement of the process overlay control for sub-40-nm DRAM
2010
·
Sarohan Park
, Eun-Ha Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Applications of MoSi-based binary intensity mask for sub-40nm DRAM
2010
·
Tae-Seung Eom
, Eun-Kyoung Shin
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Study on imaging characterization of ArF high index immersion lithography
2008
·
Sarohan Park
, Jun-Taek Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
High-etch-rate ArF BARC composed of polyester
2004
·
Young Sun Hwang
, Jae Chang Jung
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
19
Citation count:
116
H-index:
4
I10-index:
1
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