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Greg P. Hughes

Observed names: G P. Hughes, G. Hughes, G. P. Hughes, Greg Hughes
OpenAlex ID: A5081069281
Attenuated phase-shifting photomasks fabricated from Cr-based embedded shifter blanks
1994 · Franklin D. Kalk, Roger H. French, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19
Cost of ownership for future lithography technologies
2008 · Andrew J. Hazelton, Andrea Wüest, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Binary halftone chromeless PSM technology for λ/4;optical lithography
2001 · J. Fung Chen, John S. Petersen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
Issues associated with the commercialization of phase-shift masks
1992 · John L. Nistler, Greg P. Hughes, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
Estimation of cost comparison of lithography technologies at the 22-nm half-pitch node
2009 · Andrea Wüest, Andrew J. Hazelton, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Mask and wafer cost of ownership (COO) from 65 to 22 nm half-pitch nodes
2008 · Greg Hughes, Lloyd C. Litt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Predicting lithography costs: guidance for ≤ 32 nm patterning solutions
2008 · Andrew J. Hazelton, Andrea Wüest, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Focused ion-beam-induced tungsten deposition for repair of clear defects on x-ray masks
1990 · Diane K. Stewart, Lewis A. Stern, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
PROVE, the next generation registration metrology tool: status report
2010 · Dirk Beyer, Patricia Gabella, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Advanced mask metrology enabling characterization of imprint lithography templates
2005 · L. J. Myron, Liraz Gershtein, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
An X‐Ray Lithography System
1981 · W. D. Buckley, G. P. Hughes · Journal of The Electrochemical Society · 7
Design and fabrication of highly complex topographic nano-imprint template for dual damascene full 3-D imprinting
2005 · Susan MacDonald, Greg Hughes, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Chromium-based attenuated embedded shifter preproduction
1994 · Franklin D. Kalk, Roger H. French, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Mask Industry Assessment: 2007
2007 · Gilbert Shelden, Patricia Marmillion, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Mask industry assessment: 2009
2009 · Greg Hughes, Henry Yun · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Mask industry assessment: 2008
2008 · Greg Hughes, Henry Yun · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Mask industry assessment trend analysis
2008 · Gilbert Shelden, Patricia Marmillion, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Optical superlattices as phase-shift masks for microlithography
1999 · Peter F. Carcia, Roger H. French, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
The 2002 to 2010 mask survey trend analysis
2011 · Greg Hughes, David Chan · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Mask Industry Assessment: 2010
2010 · Greg Hughes, David Y. Chan · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Proximity effect correction at 10 keV using ghost and sizing for 0.4 μm mask lithography
1990 · Andrew Muray, Richard L. Lozes, et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 3
X-Ray Step-And-Repeat Lithography System For Submicron VLSI
1986 · R . B. McIntosh, Jr., G P. Hughes, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Precision Alignment For X-Ray Lithography
1984 · J L. Kreuzer, G P. Hughes, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
X-Ray Lithography: Technology For The 1980s
1982 · C. R. Fencil, G. P. Hughes · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Aberration determination in early 157-nm exposure system
2002 · Bruce W. Smith, Will Conley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Works count: 43
Citation count: 178
H-index: 8
I10-index: 4
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