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Silvio Teuber
Observed names:
S. Teuber,
Silvio Teuber Semmler,
Teuber, Silvio
Institution:
Advanced Mask Technology Center (Germany)
Observed institution:
Advanced Mask Technology Center (Germany)
OpenAlex ID:
A5081452945
Determination of mask-induced polarization effects occurring in hyper NA immersion lithography
2005
·
Silvio Teuber
, Karsten Bubke
, et al.
·
Optical Microlithography XVIII
·
13
Investigation of polarization effects on new mask materials
2005
·
Karsten Bubke
, Silvio Teuber
, et al.
·
Optical Microlithography XVIII
·
13
193-nm immersion photomask image placement in exposure tools
2006
·
Eric Cotte
, Benjamin Alles
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
Limitations of optical reticle inspection for 45-nm node and beyond
2006
·
S. Teuber
, A. Bzdurek
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Pellicle choice for 193-nm immersion lithography photomasks
2004
·
Eric P. Cotte
, Ruediger Haessler
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Mask defect printing mechanisms for future lithography generations
2006
·
Andreas Erdmann
, Thomas Graf
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Patterning of Ta/SiO 2 high transmission EAPSM material for 193nm technology
2005
·
Corinna Koepernik
, H. W. Becker
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Study of stress birefringence for 193-nm immersion photomasks
2005
·
Eric Cotte
, Michael Selle
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Determination of mask induced polarization effects on AltPSM mask structures
2005
·
Ingo Hollein
, Silvio Teuber
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
First results from AIMS beta tool for 157-nm lithography
2004
·
Silvio Teuber
, Iwao Higashikawa
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Actinic aerial image measurement for qualification of defect on 157-nm photomask
2004
·
Takashi Yasui
, Iwao Higashikawa
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Influence of mask manufacturing process on printing behavior of angled line structures
2006
·
Silvio Teuber
, Arndt C. Duerr
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Aerial image analysis for defective masks in optical lithography
2006
·
T. Graf
, A. Erdmann
, et al.
·
Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)
VUV spectrophotometry for photomasks characterization at 193 nm
2005
·
Minghong Yang
, Jork Leiterer
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
15
Citation count:
60
H-index:
5
I10-index:
2
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