Work

Pellicle choice for 193-nm immersion lithography photomasks

Year: 2004

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.569280

Authors: Eric P. Cotte, Ruediger Haessler, Benno Utess, Gunter Antesberger, Frank Kromer, Silvio Teuber

Institutions: Advanced Mask Technology Center (Germany), Leibniz Institute of Polymer Research

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1999033665

FWCI: 0.83

Cites: 6

Cited by: 5

Related to: 10