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Eric P. Cotte

Observed names: E. Cotte, E.P. Cotte, Eric Cotte
OpenAlex ID: A5031334800
Predicting mechanical distortions in x-ray masks
1999 · Eric P. Cotte, Roxann L. Engelstad, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Meeting overlay requirements for future technology nodes with in-die overlay metrology
2007 · Bernd Schulz, Rolf Seltmann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Pellicle-induced aberrations and apodization in hyper-NA optical lithography
2006 · Karsten Bubke, Benjamin Alles, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Overlay leaves litho: impact of non-litho processes on overlay and compensation
2014 · Matthias Ruhm, Bernd Schulz, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
193-nm immersion photomask image placement in exposure tools
2006 · Eric Cotte, Benjamin Alles, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Influence of the process-induced asymmetry on the accuracy of overlay measurements
2015 · Tetyana Shapoval, Bernd Schulz, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Modeling the work piece charging during e-beam lithography
2008 · Benjamin Alles, Eric Cotte, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Analysis of the Vistec LMS IPRO3 performance and accuracy enhancement techniques
2006 · Gunter Antesberger, Sven Knoth, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Pellicle choice for 193-nm immersion lithography photomasks
2004 · Eric P. Cotte, Ruediger Haessler, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Effects of soft pellicle frame curvature and mounting process on pellicle-induced distortions in advanced photomasks
2003 · Eric P. Cotte, Roxann L. Engelstad, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Determination of mask layer stress by placement metrology
2005 · Jörg Butschke, Ute Buttgereit, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
EUV mask image placement management in writing, registration, and exposure tools
2005 · Eric Cotte, Uwe Dersch, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Study of stress birefringence for 193-nm immersion photomasks
2005 · Eric Cotte, Michael Selle, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Numerical and experimental study of oxide growth on EUV mask capping layers
2004 · Eric P. Cotte, Christian Holfeld, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Hard pellicle investigation for 157-nm lithography: impact on overlay
2004 · Richard Bruls, Tammo Uitterdijk, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Experimental and Numerical Studies of the Response of Photomask Hard Pellicles to Acoustic Excitation
2002 · Eric P. Cotte, Phillip L. Reu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Mask-related distortions of modified fused silica reticles for 157-nm lithography
2002 · Andrew R. Mikkelson, Amr Y. Abdo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Equivalent modeling techniques for predicting pattern transfer in EPL masks
2001 · E.P. Cotte, E.G. Lovell, et al. · Microelectronic Engineering · 4
Mask performance improvement with mapping
2009 · Clemens Utzny, Eric Cotte, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Dynamic studies of hard pellicle response during exposure scanning
2002 · Eric P. Cotte, Amr Y. Abdo, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 3
Experimental and numerical studies of the effects of materials and attachment conditions on pellicle induced distortions in advanced photomasks
2002 · Eric P. Cotte, Roxann L. Engelstad, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Pellicle-induced distortions in advanced photomasks
2002 · Minoru Fujita, Masaya Akiyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Hard pellicle study for 157-nm lithography
2002 · Emily Y. Shu, Fu-Chang Lo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Distortions in advanced photomasks from soft pellicles
2002 · E.P. Cotte, R.L. Engelstad, et al. · Microelectronic Engineering · 3
Numerical and experimental studies of pellicle-induced photomask distortions
2002 · Eric P. Cotte, Roxann L. Engelstad, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Works count: 33
Citation count: 140
H-index: 6
I10-index: 2
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