Work

Pellicle-induced distortions in advanced photomasks

Year: 2002

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.476974

Authors: Minoru Fujita, Masaya Akiyama, Masahiro Kondo, Hiroaki Nakagawa, Daniel Tanzil, Florence O. Eschbach, Eric P. Cotte, Roxann L. Engelstad, Edward G. Lovell

Institutions: Mitsui Chemicals (Japan), Intel (United States), University of Wisconsin–Madison

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2004992158

FWCI: 0.751

Cites:

Cited by: 3

Related to: 10