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Author

Malik K. Sadiq

Observed institution: Applied Materials (United States)
OpenAlex ID: A5082051841
ALTA 4700 system mask patterning performance improvements for X-architecture and wafer electrical performance interchangeability with 50kV E-beam
2005 · Paul C. Allen, Mike Bohan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Next-generation DUV ALTA mask patterning capabilities
2004 · Paul C. Allen, Michael J. Bohan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Works count: 2
Citation count: 5
H-index: 2
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