Work

ALTA 4700 system mask patterning performance improvements for X-architecture and wafer electrical performance interchangeability with 50kV E-beam

Year: 2005

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.637280

Authors: Paul C. Allen, Mike Bohan, Eric R. Christenson, H. Dai, M. Duane, H. C. Hamaker, Sam C. Howells, Boaz Kenan, Peter Pirogovsky, Malik K. Sadiq, Robin Teitzel, Michael White

Institution: Applied Materials (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2014479332

FWCI: 0.563

Cites:

Cited by: 3

Related to: 10