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Marc Cangemi
Observed names:
M. Cangemi,
Marc J. Cangemi
Institutions:
National Institute of Standards and Technology,
Center for Nanoscale Science and Technology
Observed institutions:
National Institute of Standards and Technology,
Photronics (United States),
Center for Nanoscale Science and Technology,
IMEC
OpenAlex ID:
A5083222955
Reference metrology in a research fab: the NIST clean calibrations thrust
2009
·
Ronald Dixson
, Joe Fu
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
High transmission mask technology for 45nm node imaging
2005
·
Will Conley
, Mike Cangemi
, et al.
·
Optical Microlithography XVIII
·
4
Rectangular scale-similar etch pits in monocrystalline diamond
2011
·
Craig D. McGray
, Richard A. Allen
, et al.
·
Diamond and Related Materials
·
3
EUVL dosimetry at NIST
2009
·
C. Tarrio
, S. Grantham
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Tunable transmission phase mask options for 65/45nm node gate and contact processing
2005
·
Bryan S. Kasprowicz
, Will Conley
, et al.
·
Optical Microlithography XVIII
·
2
AAPSM repair utilizing transparent etch stop layer
2004
·
Darren Taylor
, Michael Cangemi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
EUVL dosimetry at NIST | NIST
2009
·
C. Tarrio
, Steven Grantham
, et al.
Polarization effects: EAPSM vs. TT EAPSM
2006
·
Nicoló Morgana
, Will Conley
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Manufacturability and printability of AAPSM with transparent etch stop layer
2006
·
Michael Cangemi
, Vicky Philipsen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
High-transmission mask technology for 45nm node imaging
2006
·
Will Conley
, Nicoló Morgana
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
High transmission mask technology for 45nm node imaging
2006
·
Will Conley
, Nicoló Morgana
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
A films-based approach to intensity imbalance correction for 65nm node c:PSM
2005
·
Rand Cottle
, Pierre Sixt
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Journal of Microelectronic Research - May 2003
2003
·
Jeremiah Hebding
, Robert Saxer
, et al.
·
RIT Scholar Works (Rochester Institute of Technology)
PDF
Investigation of Undercut on Alternating Aperture Phase Shift Mask
2003
·
Marc Cangemi
·
RIT Scholar Works (Rochester Institute of Technology)
PDF
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Works count:
14
Citation count:
17
H-index:
3
I10-index:
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