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Erik A. Verduijn

Observed names: E. Verduijn, Erik Verduijn
OpenAlex ID: A5083381966
BEOL process integration for the 7 nm technology node
2016 · T. Standaert, G. Beique, et al. · 35
EUV patterning successes and frontiers
2016 · Nelson Felix, Dan Corliss, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 25
Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
2015 · Obert Wood, Sudharshanan Raghunathan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 24
Imaging impact of multilayer tuning in EUV masks, experimental validation
2014 · Vicky Philipsen, Eric Hendrickx, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 23
Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images
2014 · Sudharshanan Raghunathan, Obert R. Wood, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 21
Comparison of left and right side line edge roughness in lithography
2016 · Lei Sun, Nicole Saulnier, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 20
Line edge roughness frequency analysis for SAQP process
2016 · Lei Sun, Xiaoxiao Zhang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17
Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging
2015 · Pawitter Mangat, Erik Verduijn, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16
Deconstructing contact hole CD printing variability in EUV lithography
2014 · D. Civay, T. Wallow, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
EUV vote-taking lithography: crazy... or not?
2018 · Joost Bekaert, Eric Hendrickx, et al. · 9
Printability and actinic AIMS review of programmed mask blank defects
2017 · Erik Verduijn, Pawitter Mangat, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
EUV actinic brightfield mask microscopy for predicting printed defect images
2015 · Kenneth Goldberg, Markus P. Benk, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Review of resist-based flare measurement methods for extreme ultraviolet lithography
2013 · Lei Sun, Obert R. Wood, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 6
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EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction
2018 · Joost Bekaert, Peter De Bisschop, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 5
A method of image-based aberration metrology for EUVL tools
2015 · Zac Levinson, Sudharshanan Raghunathan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
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High speed EUV using post processing and self-aligned double patterning as a speed enhancement technique
2014 · Jerome Wandell, Anton deVilliers, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology
2016 · Zachary Levinson, Erik Verduijn, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 4
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Subresolution assist features in extreme ultraviolet lithography
2015 · Deniz Civay, Erik A. Verduijn, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 4
Evaluation of EUV mask impacts on wafer line-edge roughness using aerial and SEM image analyses (Conference Presentation)
2018 · Timothy A. Brunner, Dirk Hellweg, et al. · 3
Image-based pupil plane characterization via principal component analysis for EUVL tools
2016 · Zac Levinson, Andrew Burbine, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Integration of an EUV metal layer: a 20/14nm demo
2014 · Craig Higgins, Erik Verduijn, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Evaluation of EUV mask impacts on wafer line-width roughness using aerial and SEM image analyses
2018 · Xuemei Chen, Erik Verduijn, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 2
Image-based pupil plane characterization via a space-domain basis
2017 · Zac Levinson, Andrew Burbine, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 2
Modeling EUV mask using alternative materials for mask 3D effect compensation
2015 · Vu Luong, Vicky Philipsen, et al. · 2
Prediction of EUV stochastic microbridge probabilities by lithography simulations
2020 · Erik A. Verduijn, Ulrich Welling, et al. · 1
Works count: 29
Citation count: 262
H-index: 9
I10-index: 9
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