Line edge roughness frequency analysis for SAQP process
Year: 2016
Type: conference-paper
DOI: 10.1117/12.2229176
Authors: Lei Sun, Xiaoxiao Zhang, Shimon Levi, Adam Ge, Hua Zhou, Wenhui Wang, Navaneetha Krishnan, Yulu Chen, Erik Verduijn, Ryoung-han Kim
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2316631779