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Cheolkyun Kim
Observed name:
Cheol-kyun Kim
Institution:
SK Hynix (South Korea)
Observed institution:
SK Hynix (South Korea)
OpenAlex ID:
A5085761829
Comprehensive EUV lithography model
2011
·
Mark D. Smith
, Trey Graves
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
15
OPC model accuracy study using high volume contour based gauges and deep learning on memory device
2019
·
Young-Seok Kim
, Seil Lee
, et al.
·
Metrology, Inspection, and Process Control XXXVI
·
6
Simple method for decreasing wafer topography effect for implant mask
2016
·
Taejun You
, Taehyeong Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Full-chip model-based OPC verification by using rigorous resist 3D model
2014
·
Dongho Kong
, Taejun You
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
SRAF printing prediction using artificial neural network
2020
·
Yonghwi Kwon
, Jinho Yang
, et al.
·
SPIE Optical Microlithography
·
2
Model-based pattern dummy generation for logic devices
2014
·
Jongwon Jang
, Cheolkyun Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Scanner matching using pupil intensity control between scanners in 30nm DRAM device
2011
·
Jongwon Jang
, Daejin Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Characteristics analysis of RELACS process from an OPC point of view
2012
·
Jinyoung Choi
, Minae Yoo
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
DFM flow by using combination between design based metrology system and model based verification at sub-50nm memory device
2007
·
Cheol-kyun Kim
, Jungchan Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Highly accurate modeling by using 2-dimensional calibration data set for model-based OPC verification
2006
·
Cheol-kyun Kim
, Jae-Seung Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Advanced DFM application for automated bit-line pattern dummy
2016
·
Tae Hyun Shin
, Cheolkyun Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Novel OPC method to create sub 45nm contact hole using design based metrology
2009
·
Dong-Jin Lee
, Se-young Oh
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Novel process proximity correction by the pattern-to-pattern matching method with DBM
2008
·
Dae-Jin Park
, Jinyoung Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Hybrid ORC method for Low K1 process
2005
·
Byungho Nam
, Jaeseung Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
14
Citation count:
36
H-index:
3
I10-index:
1
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