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Yoshihide Nozaki

Low Specific Contact Resistivity Measurements using a New Test Structure and its Reduction to 10−9 ohm-cm2 in p-type SiGe/Metal Contacts using Flash Lamp Annealing
2019 · Hideaki Tanimura, Hikaru Kawarazaki, et al. · International Workshop on Junction Technology · 2
Conformal Doping with High Dopant Concentration for n+/p and p+/n Si junctions in 3D Devices Using Sol-Gel Coating and Flash Lamp Annealing
2018 · Kazuhiko Fuse, Hideaki Tanimura, et al. · International Conference on Ion Implantation Technology · 1
Diffusion control of n-type dopants in Ge with high activation using co-implantation and flash lamp annealing
2019 · Hideaki Tanimura, Hikaru Kawarazaki, et al. · The Japan Society of Applied Physics
Works count: 3
Citation count: 3
H-index: 1
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