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M. N. Bosyakov
Observed name:
Mikhail N Bosyakov
Institution:
Belarusian State University of Informatics and Radioelectronics
Observed institution:
Belarusian State University of Informatics and Radioelectronics
OpenAlex ID:
A5086977071
The application of low-frequency glow discharge to high-rate deposition of a-Si:H
1998
·
Boris G Budaguan
, Alexander A. Popov
, et al.
·
Journal of Non-Crystalline Solids
·
7
Spectral investigation of polymerization processes during the plasma etching of silicon films
1981
·
M. N. Bosyakov
, A. A. Zaikov
, et al.
·
Journal of Applied Spectroscopy
The use of IR spectroscopy in studying the plasma chemical etching of silicon dioxide
1981
·
M. N. Bosyakov
, A. A. Labuda
, et al.
·
Journal of Applied Spectroscopy
Spectral methods of studying the mechanism and kinetics of the process of plasma-chemical destruction of photoresist
1980
·
N. N. Nikiforenko
, A. A. Labuda
, et al.
·
Journal of Applied Spectroscopy
Spectral investigation of the plasma-chemical etching of silicon dioxide
1979
·
M. N. Bosyakov
, N. N. Nikiforenko
, et al.
·
Journal of Applied Spectroscopy
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Works count:
5
Citation count:
7
H-index:
1
I10-index:
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