Work

Spectral investigation of polymerization processes during the plasma etching of silicon films

Year: 1981

Type: article

Source: Journal of Applied Spectroscopy

DOI: 10.1007/bf00624126

Authors: M. N. Bosyakov, A. A. Zaikov, A. A. Labuda

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2005153998

FWCI:

Cites: 4

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Related to: 10