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Author

Hideharu Kyouda

Observed name: H. Kyouda
Observed institution: Tokyo Electron Kyushu Ltd (Japan)
OpenAlex ID: A5087742984
Advanced multi-patterning using resist core spacer process for 22nm node and beyond
2012 · Yuhei Kuwahara, Satoru Shimura, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
High-etching selectivity of spin-on-carbon hard mask process for 22nm node and beyond
2012 · Fumiko Iwao, Satoru Shimura, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Novel Wafer Bevel Treatment for Water Immersion Lithography
2008 · Mamoru Terai, Takeo Ishibashi, et al. · Journal of Photopolymer Science and Technology · 3
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Process performance of novel resist material and novel coater/developer system for cross-line contact hole process
2010 · Tsuyoshi Nakamura, Jiro Yokoya, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Immersion-cluster uptime enhancement technology toward high-volume manufacturing
2009 · R. Tanaka, T. Fujiwara, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
193-nm immersion lithography for high volume manufacturing using novel immersion exposure tool and coater/developer system
2008 · Shinya Wakamizu, Hideharu Kyouda, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 6
Citation count: 13
H-index: 3
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