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Advanced multi-patterning using resist core spacer process for 22nm node and beyond

Year: 2012

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.916327

Authors: Yuhei Kuwahara, Satoru Shimura, Hideharu Kyouda, Kenichi Oyama, Shohei Yamauchi, Arisa Hara, Sakurako Natori, Hidetami Yaegashi

Institutions: Tokyo Electron Kyushu Ltd (Japan), Tokyo Electron (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2087789413

FWCI: 2.431

Cites:

Cited by: 6

Related to: 10