Author

Kenichi Oyama

Institutions: Tokyo Electron (Japan), Tokyo Electron Technology Solutions Limited (Japan)

Observed institutions: Tokyo Electron (Japan), Tokyo Electron Technology Solutions Limited (Japan)

OpenAlex ID: A5113560698

Overview: continuous evolution on double-patterning process

2012 · Hidetami Yaegashi, Kenichi Oyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 53

Novel approaches to implement the self-aligned spacer double-patterning process toward 11-nm node and beyond

2011 · Hidetami Yaegashi, Kenichi Oyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 25

Recent progress on multiple-patterning process

2014 · Hidetami Yaegashi, Kenichi Oyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 20

Immersion lithography extension to sub-10nm nodes with multiple patterning

2014 · Soichi Owa, Shinji Wakamoto, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19

Robust complementary technique with multiple-patterning for sub-10 nm node device

2014 · Kenichi Oyama, Shohei Yamauchi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17

The important challenge to extend spacer DP process towards 22nm and beyond

2010 · Kenichi Oyama, Eiichi Nishimura, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17

Sub-12nm optical lithography with 4x pitch division and SMO-lite

2013 · Michael C. Smayling, Koichiro Tsujita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16

Process variability of self-aligned multiple patterning

2013 · Kenichi Oyama, Shohei Yamauchi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16

Advanced self-aligned DP process development for 22-nm node and beyond

2010 · Arisa Hara, Eiichi Nishimura, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16

Improvement of lithographic performance and reduction of mask cost by simple OPC

2012 · Koichiro Tsujita, Koji Mikami, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14

Sustainable scaling technique on double-patterning process

2013 · Hidetami Yaegashi, Kenichi Oyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13

CD error budget analysis for self-aligned multiple patterning

2012 · Kenichi Oyama, Sakurako Natori, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13

The enhanced photoresist shrink process technique toward 22nm node

2011 · Kenichi Oyama, Shohei Yamauchi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12

Important Challenge for Optical Lithography Extension utilizing Double Patterning Process

2011 · Hidetami Yaegashi, Kenichi Oyama, et al. · Journal of Photopolymer Science and Technology · 12

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Sub-20nm logic lithography optimization with simple OPC and multiple pitch division

2012 · Michael C. Smayling, Valery Axelrad, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

Sustainability and applicability of spacer-related patterning towards 7nm node

2015 · Kenichi Oyama, Shohei Yamauchi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

7nm logic optical lithography with OPC-Lite

2015 · Michael C. Smayling, Koichiro Tsujita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Extendibility of self-aligned type multiple patterning for further scaling

2013 · Shohei Yamauchi, Arisa Hara, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Advanced multi-patterning using resist core spacer process for 22nm node and beyond

2012 · Yuhei Kuwahara, Satoru Shimura, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Pattern fidelity in multiple-patterning process

2014 · Masatoshi Yamato, Sakurako Natori, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Innovative solutions on 193 immersion-based self-aligned multiple patterning

2014 · Sakurako Natori, Shohei Yamauchi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Considerations for pattern placement error correction toward 5nm node

2017 · Hidetami Yaegashi, Kenichi Oyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

CD bias control on hole pattern

2016 · Kyohei Koike, Arisa Hara, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Recent progress on multipatterning: approach to pattern placement correction

2015 · Hidetami Yaegashi, Kenichi Oyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

11nm logic lithography with OPC-lite

2014 · Michael C. Smayling, Koichiro Tsujita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Works count: 54

Citation count: 369

H-index: 12

I10-index: 15